Archives: News
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eBeam Initiative to Expand Education Efforts on eBeam Technology Requirements for EUV and Nanoimprint Lithography
SAN JOSE, Calif., February 23, 2016–The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam…
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Imec reveals impact of DSA process variations on electrical performance of DSA-formed vias.
Leuven (Belgium) Feb 24, 2016 – Today, at SPIE Advanced Lithography Conference (San Jose, Feb 21-25), world-leading nanoelectronics research center imec will present electrical results…
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GrammaTech Announces Binary Analysis Support for ARM
Ithaca/USA, Nuremberg, Germany — February 23, 2016 – GrammaTech, a leading provider of software assurance, hardening, and cyber-security solutions, today announced expansion of CodeSonar’s static analysis engine…
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Synopsys to Showcase Software Integrity Platform for ‘Software Signoff’ at RSA Conference
MOUNTAIN VIEW, Calif., Feb. 25, 2016 /PRNewswire/ — Synopsys, Inc. (Nasdaq: SNPS) today announced it will showcase its Software Integrity Platform, a comprehensive suite of software security testing…
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SmartDV Releases Portfolio of Verification Intellectual Properties that Support Platform-independent Simulation Acceleration (SimXL)
SAN DIEGO, CA – February 26, 2016 – Simulation is becoming a major bottleneck in the development of large, complex system-on-chip (SoC) designs. Verification is…
